MIC-ZFA 2010 measurement microscope with split-image function is independently developed by our company. It is based on image measurement principle, uses detection of optical focal point method to do non-contact height difference measurement. It can not only observe surface states of measured point, but also carry out measurement for height, depth and height difference. This instrument also has ability to observe light and dark file, polarized light, so it is particularly suitable to be used to observe height difference with very little gap、inclusion、protuberance and very little scratches. This product is applicable to detection and observation for silicon wafer、IC、LCD、TFT、PCB、MEMS laser processing、wafer testing、semiconductor material、wiring hardness etching、LCD battery cover、wiring frame product etc.